Uniformity photoresist bake lamp

Sat, 27 Jun 2026 04:47:34 +0800

On the line, photoresist profile is set in the first bake. A 5°C swing across the wafer skews CD, ruins overlay, and wastes expensive rework. We built our uniformity photoresist bake lamp to remove that uncertainty. What Matters Technically We use short-wave halogen lamps in a reflector cavity engineered for ±0.1°C wafer-level uniformity. Integrated pyrometry closes the loop in milliseconds, holding soft bake and hard bake temperatures with tight repeatability. The lamp head runs Class 1–100 cleanroom compatible, with low-outgassing materials and zero particle generation at the face. Carbon-fiber insulation keeps thermal mass low and stabilizes temperature fast, while the quartz envelope survives repeated thermal cycling. Expect 5,000+ hours at full output with less than 5% drop. Why It Works Here This unit covers wafer drying, photoresist bake, packaging cure, and cleaning dry without changing tools. Tight uniformity reduces edge bead and improves yield across the lot. Fast settling shortens bake time, cutting energy use and raising throughput. Process windows widen because the thermal budget is controlled, not guessed. Things to Know The lamp is compatible with standard track interfaces, but the reflector geometry must match your wafer size and chuck profile. Expect a short commissioning run to tune PID and confirm temperature mapping at process points. Operating near quartz’s upper thermal limit shortens life; we recommend staying below 650°C for sustained reliability.

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Uniformity photoresist bake lamp